rapid thermal annealing的意思|示意
快速热退火
rapid thermal annealing的网络常见释义
快速热退火 ... L引言 为了获得大规模和超大规模集成电路工艺所需要的p+一n浅结,利用分子离子BF犷注人结合快速热退火(RaPid Thermal Annealing,RTA)是一种有效的途径,因而引起了各国学者的重视氏刀.然而,BF才注人多晶硅薄膜及其退火行为研究得较少囚.
快速退火 ...击穿电压；快速退火[gap=1310]Key words: AlN thin films; magnetron sputtering; breakdown voltage; rapid thermal annealing(RTA)...
快速热处理 实验比较了常规热处理(conventional thermal annealing,CTA)和快速热处理(rapid thermal annealing,RTA)方式,用X射线衍射和能量散射X射线能谱研究了热处理方式和热处理制度对薄膜方阻的影响,分别得到了CTA...
rapid thermal annealing相关短语
1、 rapid thermal annealing process 快速加热退火制作工艺 ; 快速退火工艺
2、 rapid thermal annealing rta 快速热退火
3、 vacuum rapid thermal annealing 真空快速热退火
rapid thermal annealing相关例句
Polycrystalline nickel silicide film formed on thin oxide by rapid thermal annealing (RTA) has been investigated by capacitance voltage ( C V ) measurements.
本文研究了在薄二氧化硅层上快速热退火（RTA）形成的多晶硅化镍膜的电特性。
The results indicate that the pyrochlore phase was restrained successfully by layer-by-layer rapid thermal annealing method.
实验结果表明，逐层快速退火工艺可有效抑制焦绿石相的形成；
Partially crystallized Ba ferrite thin films were prepared by the strict controlling of the rapid thermal annealing time for as deposited amorphous thin films.
对于沉积态非晶薄膜，通过严格控制其快速热处理时间，从而制备出了部分晶化钡铁氧体薄膜。
The CCTO films prepared with different preheating temperature after rapid thermal annealing treatment have the smaller dielectric loss, and the values lie in between 0.1~0.35.
不同预烧温度所制备的CCTO薄膜，经快速热退火处理后，其介电损耗值较小，基本在0.1~0.35之间。
The results show that a thermal annealing at the proper temperature of experiments can significantly improve the optical homogeneity of the crystals, especially for the crystal grown at a rapid speed.
结果表明，适当温度的退火处理能有效地提高晶体的光学均匀性，尤其是对快速生长的晶体质量提高更为显著。
At last, the effect of rapid thermal annealing on the electrical properties of HEMT material is studied.
最后我们研究了快速退火对HEMT材料电学性能的影响。