radio frequency glow discharge的意思|示意

Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.

射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。

It proposes a way to obtain atmospheric radio frequency glow discharge with high stability and reduced power consumption by operating discharge in ignition phase.

通过短时间脉冲调制获得了将射频放电控制工作在放电起辉阶段，提出了一种新型的高稳定低功耗的常压放电技术。

Modification effect of hot filament gas discharge PIII was compared with that of radio-frequency (RF) glow discharge PIII.

分析比较了灯丝放电PIII和射频辉光放电PIII对基体表面进行氮离子注入后的改性效果。

Plasma in radio frequency (rf) glow discharge is widely used in the preparation of semiconductor film materials and microelectronic industry.

射频辉光放电等离子体在微电子及半导体薄膜材料生长等方面有着广泛的应用。